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reticle transfers to and from the reticle pod
SEMI E151 — Guide for Understanding Data Quality
boron and phosphorus concentrations are constant with depth
This standard defines the items of the required and common design information at a reticle design and a recipe preparation for wafer exposure equipment
This Document provides a common basis for communication between manufacturers and users
P04000 - SEMI P40 - 極紫外線リソグラフィマスクの取り付けに関する要求条件およびアライメント基準位置の仕様 Revision:SEMI P40-1103 - Superseded reticle transfers to and fromGlobal Micropatterning CommitteeNorth American Micropatterning Committee200393North American Regional Standards Committee20039www. semi. org200311 EUVL Referenced SEMI Standards SEMI P37 Specification for Extreme Ultraviolet Lithography Mask Substrates SEMI P38 Specification for Absorbing Film Stacks and Multilayers on Extreme Ultraviolet Lithography Mask Blanks
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