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SEMI C28-0704 (technical revision)
The Analytical Procedures are listed in Table 1
This Document covers guides for 3MS used in the semiconductor industry for plasma enhanced chemical vapor deposition (PECVD) as low k dielectric and as a SiC etch stop
This Standard defines three methods for testing chemical durability of various flat panel display substrates: (Method A) Weight Loss
The intent of these specifications and the associated procedures is
C0700 - SEMI C70 - Specification for Tungsten Hexafluoride (WF6) Lang-English SEMI C28-0704 (technical revision)1 Purpose 1. 1 The purpose of this Document is to provide specifications for tungsten hexafluoride (WF6) that are used in the semiconductor industry. 2 Scope 2. 1 This Document covers requirements for tungsten hexafluoride used in the semiconductor industry. Referenced SEMI Standards (purchase separately) SEMI C1 Guide for the Analysis of Liquid Chemicals SEMI C3 Specifications for Gases SEMI C10 Guide for Determination of Method Detection Limits
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